US 6,981,508 B2
On-site cleaning gas generation for process chamber cleaning
Quanyuan Shang, Saratoga, Calif. (US); Sanjay Yadav, Redwood City, Calif. (US); William R. Harshbarger, San Jose, Calif. (US); and Kam S. Law, Union City, Calif. (US)
Assigned to Applied Materials, Inc., Santa Clara, Calif. (US)
Filed on May 27, 2004, as Appl. No. 10/856,654.
Application 10/856654 is a continuation of application No. 09/741529, filed on Dec. 19, 2000, granted, now 6,843,258.
Prior Publication US 2004/0216768 A1, Nov. 04, 2004
This patent is subject to a terminal disclaimer.
Int. Cl. B08B 9/093 (2006.01)
U.S. Cl. 134—22.18 26 Claims
OG exemplary drawing
 
1. A method for cleaning a process chamber for semiconductor and/or flat panel display manufacturing, comprising:
converting a feed gas to a mixture of the feed gas and a cleaning gas in a device at a remote location and in fluid communication with the process chamber;
separating the feed gas from the cleaning gas by liquefying the feed gas; and
delivering the cleaning gas to the process chamber.