US 6,981,407 B2 | ||
Atomic force microscopy measurements of contact resistance and current-dependent stiction | ||
Shiva Prakash, Santa Barbara, Calif. (US) | ||
Assigned to Fidelica Microsystems, Inc., Milpitas, Calif. (US) | ||
Filed on Jul. 03, 2003, as Appl. No. 10/613,446. | ||
Application 10/613446 is a division of application No. 10/202439, filed on Jul. 23, 2002, granted, now 6,612,161. | ||
Prior Publication US 2004/0020284 A1, Feb. 05, 2004 | ||
Int. Cl. G01B 5/28 (2006.01) |
U.S. Cl. 73—150A | 19 Claims |
1. A method of testing comprising:
disposing a first film of a first contact material on a substrate;
mounting the substrate on a chuck of an atomic force microscope;
disposing a second film of a second contact material on a rounded end piece of an arm of the atomic force microscope; and
measuring a characteristic related to the first film and the second film contacting using at least one measurement circuit
to perform at least one measurement after the first film and the second film contact each other at a controlled force, wherein
the characteristic is a contact resistance and the step of measuring measures the contact resistance between the first film
and the second film.
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