US 6,982,813 B2
Light quantity correction method for exposing device, and image forming device
Katsuyuki Hirata, Aichi-Ken (Japan); Kentaro Katori, Toyokawa (Japan); Tetsuya Sakai, Aichi-Ken (Japan); and Tomoki Wada, Daito (Japan)
Assigned to Minolta Co., Ltd., Osaka (Japan)
Filed on Feb. 06, 2001, as Appl. No. 9/776,883.
Claims priority of application No. 2000-037750 (JP), filed on Feb. 16, 2000; and application No. 2000-251847 (JP), filed on Aug. 23, 2000.
Prior Publication US 2001/0040676 A1, Nov. 15, 2001
Int. Cl. G03B 27/32 (2006.01); G06E 1/02 (2006.01); B41J 2/45 (2006.01); G06K 9/32 (2006.01)
U.S. Cl. 358—1.9 30 Claims
OG exemplary drawing
 
1. A light quantity correction method for an exposing device provided with a plurality of light emitting elements comprising steps of:
Step 1 where the exposing device is allowed to emit light in a plurality of light emission patterns, and quantity of light emitted from each light emitting element is measured for each light emission pattern;
Step 2 where a change rate of a light quantity distribution of the exposing device is calculated based on the light quantity measured for each light emission pattern; and
Step 3 where a correction value for the light quantity emitted from each light emitting element is calculated based on the light quantity measured in the Step 1 and the change rate of the light quantity distribution calculated in the Step 2.