US 6,981,521 B2
Exhaust valve for semiconductor manufacturing process
Tae-Yeol Joung, Hwaseong (Korea, Republic of)
Assigned to Daemyung Engineering Co., Ltd., (Korea, Republic of)
Filed on Feb. 18, 2004, as Appl. No. 10/779,651.
Claims priority of application No. 10-2003-0010580 (KR), filed on Feb. 20, 2003.
Prior Publication US 2004/0163720 A1, Aug. 26, 2004
Int. Cl. F16K 11/085 (2006.01)
U.S. Cl. 137—625.47 3 Claims
OG exemplary drawing
 
1. An exhaust valve for semiconductor manufacturing process, comprising:
a valve body having a chamber formed at the center thereof and exhaust ports formed at left and right sides thereof and connected to treatment devices respectively;
a rotary cylinder rotatably coupled to the chamber of the valve body, the rotary cylinder having an inlet formed in the lower portion thereof for entrance of exhaust gas, an opening formed at a side thereof and communicating with the inlet so as to selectively open and close the exhaust ports, and a shaft portion formed on the upper portion thereof;
a protective cover coupled to the outer circumferential surface of the rotary cylinder;
an exhaust guide member coupled to the lower portion of the valve body for guiding exhaust gas discharged from a vacuum pump to the inlet of the rotary cylinder;
an adapter seated on the upper portion of the valve body and surrounding the shaft portion of the rotary cylinder;
an actuator coupled to the upper portion of the adapter for rotating the rotary cylinder in right and left directions; and
sensing means mounted at the upper portion of the valve body for sensing the opening position of the exhaust ports,
characterized in that a first sealing member is mounted between the rotary cylinder and the protective cover.