US 6,982,822 B2 | ||
High-flux entangled photon generation via parametric processes in a laser cavity | ||
Malvin C. Teich, Boston, Mass. (US); Bahaa E. A. Saleh, Lexington, Mass. (US); Alexander V. Sergienko, Boston, Mass. (US); John T. Fourkas, Brookline, Mass. (US); Ralf Wolleschensky, Schoeten (Germany); Michael Kempe, Kunitz (Germany); and Mark C. Booth, Cambridge, Mass. (US) | ||
Assigned to Trustees of Boston University, Boston, Mass. (US); The Trustees of Boston College, Chesnut Hill, Mass. (US); and Carl Zeiss Jena GmbH, (Germany) | ||
Filed on May 22, 2003, as Appl. No. 10/443,262. | ||
Application 10/443262 is a continuation of application No. PCT/US01/44889, filed on Nov. 30, 2001. | ||
Claims priority of provisional application 60/250175, filed on Nov. 30, 2000. | ||
Prior Publication US 2004/0042513 A1, Mar. 04, 2004 | ||
Int. Cl. G02F 1/39 (2006.01); G02F 1/37 (2006.01) |
U.S. Cl. 359—330 | 18 Claims |
1. An apparatus for generating a strong source of doubly or multiply entangled photons emitted non-colinearly or colinearly
with respect to the pump light that is at frequency 2f comprising:
a laser medium producing classical laser light at fundamental frequency f;
a medium for second harmonic generation transforming the light at fundamental frequency f to its second-harmonic frequency
2f and emitting entangled photons non-colinearly with respect to the light at the second harmonic frequency; and
an optical cavity element around the laser medium and the medium for second harmonic generation comprising of at least two
mirrors that are highly reflective at the light frequencies f and 2f;
wherein a parametric process or a set of simultaneous parametric processes are used to generate the entangled photons at light
frequencies around f including at least one optical cavity resonant at frequency 2f at least around the medium for entangled
photon generation, comprising of at least two mirrors that are highly reflective at the light frequency 2f.
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