US 6,982,906 B2 | ||
Electrically programmable and electrically erasable semiconductor memory device | ||
Nobuaki Matsuoka, Tenri (Japan); Masaru Nawaki, Nara (Japan); Yoshinao Morikawa, Ikoma (Japan); Hiroshi Iwata, Ikoma-gun (Japan); and Akihide Shibata, Nara (Japan) | ||
Assigned to Sharp Kabushiki Kaisha, Osaka (Japan) | ||
Filed on May 06, 2004, as Appl. No. 10/841,688. | ||
Claims priority of application No. 2003-131984 (JP), filed on May 09, 2003. | ||
Prior Publication US 2004/0223372 A1, Nov. 11, 2004 | ||
Int. Cl. G11C 16/06 (2006.01) |
U.S. Cl. 365—185.19 | 6 Claims |
1. A semiconductor memory device comprising:
an electrically programmable and erasable nonvolatile memory cell which includes a plurality of memory cells requiring a first
potential for reading data and a second potential for programming data, the second potential being higher than the first potential,
and which is assembled on a substrate;
latch means for receiving data and temporarily storing the data;
pulse generation means for generating a pulse used for programming data into a memory cell, the pulse generation means being
coupled in order to receive the second potential;
comparator means for comparing data in the latch means with data in a memory cell; and
control means for controlling the pulse generation means to repeatedly generate a pulse until the data in the latch means
matches the data in the memory cell, the control means being coupled to the comparator means and the pulse generation means,
wherein
the control means controls the pulse generation means so that the pulse is repeatedly generated until data is programmed in
a memory cell, and
the nonvolatile memory cell includes a gate electrode formed on a semiconductor layer via a gate insulating film, a channel
region disposed under the gate electrode, diffusion regions disposed on both sides of the channel region and having a conductive
type opposite to that of the channel region; and memory functional units formed on both sides of the gate electrode and having
the function of retaining charges.
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