US 6,982,427 B2 | ||
Electron beam apparatus with aberration corrector | ||
Takeshi Kawasaki, Musashino (Japan); Takaho Yoshida, Kodaira (Japan); Yoichi Ose, Mito (Japan); and Hideo Todokoro, Hinode (Japan) | ||
Assigned to Hitachi High Technologies Corporation, Tokyo (Japan) | ||
Filed on Jan. 12, 2004, as Appl. No. 10/754,581. | ||
Claims priority of application No. 2003-094285 (JP), filed on Mar. 31, 2003. | ||
Prior Publication US 2004/0188635 A1, Sep. 30, 2004 | ||
Int. Cl. G01K 1/08 (2006.01); G21K 1/08 (2006.01) |
U.S. Cl. 250—396R | 8 Claims |
1. An electron beam apparatus with an aberration corrector, said apparatus comprising:
an electron optical system which has at least an electron gun for emitting an electron beam, a condenser lens, an objective
lens for converging an electron beam onto a surface of a specimen, and a scanning deflector for causing the converged electron
beam to scan the surface of the specimen;
said aberration corrector composed of a plurality of combined multipole lenses; and
a computer for controlling at least one of the electron optical system and said aberration corrector, said computer having
a first scan mode for enabling operation of said aberration corrector and a second scan mode for disabling the operation of
said aberration corrector and controlling said objective lens, said condenser lens, or said aberration corrector such that
an object point of the objective lens does not substantially change in either of the modes.
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