1. A method for repairing a photomask comprising:
providing a transparent photomask substrate having a defect formed within the transparent photomask substrate; and
forming into the transparent photomask substrate a multi-stepped aperture which eliminates the defect, the multi-stepped aperture
having a series of progressive steps which separate a series of progressive plateaus, each plateau having a plateau width
and step height such as to enhance transparent photomask substrate transmittance within the multi-stepped aperture.
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