US 6,982,133 B2
Damage-resistant coatings for EUV lithography components
Manish Chandhok, Beaverton, Oreg. (US); and Kramadhati V. Ravi, Atherton, Calif. (US)
Assigned to Intel Corporation, Santa Clara, Calif. (US)
Filed on Dec. 21, 2002, as Appl. No. 10/327,599.
Prior Publication US 2004/0121243 A1, Jun. 24, 2004
Int. Cl. G01F 9/00 (2006.01)
U.S. Cl. 430—5 21 Claims
OG exemplary drawing
 
1. A method for protecting a lithographic component from damage, comprising:
depositing a diamond coating onto radiation-exposed surfaces of the component using a plasma-enhanced chemical vapor deposition process; and
wherein said depositing is depositing a diamond coating onto the reflecting surfaces of a reflecting mask reticle.