US 6,982,217 B2 | ||
Nano-structure and method of manufacturing nano-structure | ||
Aya Imada, Kanagawa (Japan); and Tohru Den, Tokyo (Japan) | ||
Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
Filed on Mar. 20, 2003, as Appl. No. 10/391,632. | ||
Claims priority of application No. 2002-088206 (JP), filed on Mar. 27, 2002; and application No. 2002-128465 (JP), filed on Apr. 30, 2002. | ||
Prior Publication US 2003/0186514 A1, Oct. 02, 2003 | ||
Int. Cl. H01L 21/20 (2006.01); H01L 21/302 (2006.01); H01L 21/461 (2006.01) |
U.S. Cl. 438—584 | 16 Claims |
1. A structure having a plurality of projections, comprising:
a first projection formed on a first layer containing a first material; and
a plurality of second projections formed around the first projection and containing a material capable of being subjected
to anodic oxidation,
wherein a height difference between the first projection and each of the plurality of second projections is not more than
200 nm.
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