US 6,982,841 B2 | ||
Mirror holding mechanism in exposure apparatus, and device manufacturing method | ||
Yoshiki Kino, Utsunomiya (Japan); Yoshinori Miwa, Utsunomiya (Japan); and Masanori Honda, Utsunomiya (Japan) | ||
Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
Filed on Feb. 13, 2004, as Appl. No. 10/778,810. | ||
Claims priority of application No. 2003-035271 (JP), filed on Feb. 13, 2003. | ||
Prior Publication US 2004/0218289 A1, Nov. 04, 2004 | ||
Int. Cl. G02B 7/02 (2006.01); G02B 7/182 (2006.01); G03B 21/14 (2006.01) |
U.S. Cl. 359—822 | 25 Claims |
1. A holding system, comprising:
a supporting member for supporting an optical element approximately at six points through three first spherical members,
wherein said supporting member has three grooves each extending in an approximately radial direction about a predetermined
point,
wherein the three grooves and the three first spherical members are engaged with each other to position the optical element,
and
wherein each of the three grooves is movable in the approximately radial direction.
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