US 6,982,217 B2
Nano-structure and method of manufacturing nano-structure
Aya Imada, Kanagawa (Japan); and Tohru Den, Tokyo (Japan)
Assigned to Canon Kabushiki Kaisha, Tokyo (Japan)
Filed on Mar. 20, 2003, as Appl. No. 10/391,632.
Claims priority of application No. 2002-088206 (JP), filed on Mar. 27, 2002; and application No. 2002-128465 (JP), filed on Apr. 30, 2002.
Prior Publication US 2003/0186514 A1, Oct. 02, 2003
Int. Cl. H01L 21/20 (2006.01); H01L 21/302 (2006.01); H01L 21/461 (2006.01)
U.S. Cl. 438—584 16 Claims
OG exemplary drawing
 
1. A structure having a plurality of projections, comprising:
a first projection formed on a first layer containing a first material; and
a plurality of second projections formed around the first projection and containing a material capable of being subjected to anodic oxidation,
wherein a height difference between the first projection and each of the plurality of second projections is not more than 200 nm.