US 6,982,786 B2
Reticle and optical characteristic measuring method
Yoshihiro Shiode, Utsunomiya (Japan)
Assigned to Canon Kabushiki Kaisha, Tokyo (Japan)
Filed on Dec. 03, 2002, as Appl. No. 10/307,945.
Application 10/307945 is a continuation of application No. PCT/JP02/07342, filed on Jul. 19, 2002.
Claims priority of application No. 2002/114425 (JP), filed on Apr. 17, 2002.
Prior Publication US 2003/0197865 A1, Oct. 23, 2003
Int. Cl. G01J 1/00 (2006.01); G01B 11/00 (2006.01)
U.S. Cl. 356—121 30 Claims
OG exemplary drawing
 
1. An optical characteristic measuring method for measuring an optical characteristic of a projection optical system, said method comprising:
supplying a reticle having a plurality of patterns;
directing scattered light beams from an aperture formed on a light blocking member to the plurality of patterns on the reticle, whereby respective light beams which are from the aperture and which are incident on each of the plurality of patterns are in mutually different directions, by which images of the plurality of patterns are formed through the projection optical system; and
detecting positions of the images of the plurality of patterns and, by use of the result of the detection, detecting the optical characteristic of the projection optical system,
wherein the pattern has lines and spaces for directing substantially only zeroth order light to the projection optical system.