US 6,982,841 B2
Mirror holding mechanism in exposure apparatus, and device manufacturing method
Yoshiki Kino, Utsunomiya (Japan); Yoshinori Miwa, Utsunomiya (Japan); and Masanori Honda, Utsunomiya (Japan)
Assigned to Canon Kabushiki Kaisha, Tokyo (Japan)
Filed on Feb. 13, 2004, as Appl. No. 10/778,810.
Claims priority of application No. 2003-035271 (JP), filed on Feb. 13, 2003.
Prior Publication US 2004/0218289 A1, Nov. 04, 2004
Int. Cl. G02B 7/02 (2006.01); G02B 7/182 (2006.01); G03B 21/14 (2006.01)
U.S. Cl. 359—822 25 Claims
OG exemplary drawing
 
1. A holding system, comprising:
a supporting member for supporting an optical element approximately at six points through three first spherical members,
wherein said supporting member has three grooves each extending in an approximately radial direction about a predetermined point,
wherein the three grooves and the three first spherical members are engaged with each other to position the optical element, and
wherein each of the three grooves is movable in the approximately radial direction.