US 6,983,215 B2 | ||
RF metrology characterization for field installation and serviceability for the plasma processing industry | ||
David J. Coumou, Webster, N.Y. (US); Clifford C. Weatherell, Rochester, N.Y. (US); Michael L. Kirk, Bloomfield, N.Y. (US); and Kevin Nasman, North Chili, N.Y. (US) | ||
Assigned to MKS Instruments, Inc., Andover, Mass. (US) | ||
Filed on Dec. 02, 2003, as Appl. No. 10/727,081. | ||
Prior Publication US 2005/0119864 A1, Jun. 02, 2005 | ||
Int. Cl. G01R 35/00 (2006.01) |
U.S. Cl. 702—106 | 20 Claims |
1. A radio frequency (RF) metrology system for monitoring output of an RF generator to a load comprising:
a sensor, the sensor sensing at least one of a voltage or current applied to a load;
an analysis module, the analysis module receiving at least one of a voltage sensor signal or current sensor signal from the
sensor;
wherein at least one of the sensor or the analysis module is replaceable while the other of the sensor or analysis module
remains installed and wherein the RF metrology system is recalibrated following replacement of the other of the sensor or
analysis module.
|