US 6,981,410 B2
Flow sensor and method of manufacturing the same
Koji Seki, Tokyo (Japan); Nobuhiko Zushi, Tokyo (Japan); Shinichi Ike, Tokyo (Japan); Seishi Nakano, Tokyo (Japan); Tarou Nakata, Tokyo (Japan); and Shoji Kamiunten, Tokyo (Japan)
Assigned to Yamatake Corporation, Tokyo (Japan)
Filed on May 09, 2003, as Appl. No. 10/434,563.
Claims priority of application No. 2002-135283 (JP), filed on May 10, 2002; and application No. 2002-243589 (JP), filed on Aug. 23, 2002.
Prior Publication US 2004/0025585 A1, Feb. 12, 2004
Int. Cl. G01F 1/68 (2006.01)
U.S. Cl. 73—204.26 13 Claims
OG exemplary drawing
 
1. A flow sensor comprising:
a substrate in which a diaphragm portion having a first surface in contact with a measurment target fluid and a thick fixing portion surrounding the diaphragm portion are integrally formed;
an electrical insulating film formed on a second surface of the diaphragm portion which is on a side opposite to the first surface; and
flow velocity detecting means arranged on the electrical insulating film,
wherein the flow velocity detecting means is disposed through said electrical insulating film on the second surface of the diaphragm portion.