US 6,982,773 B2 | ||
Exposure system for creating a patterned polarization compensator | ||
Andrew F. Kurtz, Rochester, N.Y. (US); Barry D. Silverstein, Rochester, N.Y. (US); and Xiang-Dong Mi, Rochester, N.Y. (US) | ||
Assigned to Moxtek, Inc., Orem, Utah (US) | ||
Filed on Feb. 01, 2005, as Appl. No. 11/48,557. | ||
Application 11/048557 is a division of application No. 10/712172, filed on Nov. 13, 2003, granted, now 6,900,866. | ||
Application 10/712172 is a continuation in part of application No. 10/040663, filed on Jan. 07, 2002, granted, now 6,909,473. | ||
Prior Publication US 2005/0128392 A1, Jun. 16, 2005 | ||
Int. Cl. G02F 1/1335 (2006.01); G03B 21/14 (2006.01); G02B 5/30 (2006.01) |
U.S. Cl. 349—117 | 14 Claims |
1. An exposure system for creating a patterned polarization compensator comprising:
(a) a light source for providing an incident beam of light;
(b) polarization optics including at a polarization beamsplitter, for transmitting light of said beam of light having a first
polarization, and for reflecting light of said beam of light having a second polarization orthogonal to said first polarization;
(c) a polarization based reflective spatial light modulator having an undesired spatial retardance variation; wherein said
modulator receives said polarized beam of light, having either a first polarization or a second polarization, and selectively
modulates said polarized beam of light to encode data thereon, providing both modulated light and unmodulated light which
differ in polarization;
(d) wherein said reflective spatial light modulator reflects back both said modulated light and said unmodulated light to
said polarization beamsplitter;
(e) an imaging lens which uses said modulated light to create an image of said reflective spatial light modulator onto a light-sensitive
material; and
(f) wherein said light-sensitive material is exposed and patterned with variations that correlate with said undesired spatial
retardance variation of said polarization based reflective spatial light modulator, thereby facilitating the fabrication of
a patterned polarization compensator.
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