US 6,982,789 B1
Monochromator system and applications thereof
Duane E. Meyer, Lincoln, Nebr. (US)
Assigned to J.A. Woollam Co. Inc., Lincoln, Nebr. (US)
Filed on Aug. 08, 2003, as Appl. No. 10/637,051.
Application 10/637051 is a continuation in part of application No. 09/531877, filed on Mar. 21, 2000, granted, now 6,535,286.
Claims priority of provisional application 60/431489, filed on Dec. 06, 2002.
Int. Cl. G01J 3/12 (2006.01)
U.S. Cl. 356—331 7 Claims
OG exemplary drawing
 
1. A monochromator system for selecting a small range of wavelengths in a polychromatic beam of electromagnetic radiation, which monochromator system functionally sequentially comprises within in a substantially enclosed space containing enclosing means having vertical, longitudinal and lateral dimensions:
source means for providing of a beam of electromagnetic radiation;
first slit providing means;
first mirror;
first stage comprising a plurality of gratings, each of which can be rotated into a functional position;
second mirror providing element;
second slit providing means;
third mirror;
second stage comprising a plurality of gratings, each of which can be rotated into a functional position;
fourth mirror;
order sorting filter means;
pin hole providing means;
and further comprises beam chopper means after said source means for providing of a beam of electromagnetic radiation;
said source means for providing a beam of electromagnetic radiation comprising both Xenon and Deuterium Lamps and source selecting mirror and motion imparting means for selecting therebetween;
said second mirror being laterally present between said first mirror and said second stage which comprises a plurality of gratings, and said third mirror being laterally positioned between said first stage which comprises a plurality of gratings and said fourth mirror,
said first mirror and second mirror and said second stage comprising a plurality of gratings as a group being longitudinally removed from said first stage which comprises a plurality of gratings and said third mirror and said fourth mirror;
there being first electromagnetic radiation blocking baffle means positioned between said source means for providing of a beam of electromagnetic radiation and said first stage comprising a plurality of gratings;
there being second electromagnetic radiation blocking baffle means positioned between said second mirror providing element and said second stage comprising a plurality of gratings;
there being third electromagnetic radiation blocking baffle means positioned between said third mirror providing element and said first stage comprising a plurality of gratings;
there being fourth electromagnetic radiation blocking baffle means positioned between said first and second mirrors;
there being fifth electromagnetic radiation blocking baffle means positioned between said third and fourth mirrors;
there being sixth electromagnetic radiation blocking baffle means positioned between said second stage comprising a plurality of gratings and said pin hole providing means;
such that in use a beam of electromagnetic radiation provided by said source means for providing of a beam of electromagnetic radiation is:
caused to pass through said first slit;
reflect from said first mirror;
interact with one of said plurality of gratings on said first stage which is rotated into a functional position;
reflect from said second mirror;
pass through said second slit;
reflect from said third mirror;
interact with one of said plurality of gratings on said second stage which is rotated into a functional position;
reflect from said fourth mirror, proceed through order sorting filtering means;
said beam of electromagnetic radiation further being chopped by said chopping means;
with monochromator selected wavelengths being caused to exit through said pinhole;
the improvements being that:
said Deuterium lamp is mounted on a stage which enables three dimensional X-Y-Z positioning motion controlled from outside said enclosing means;
said beam chopping means, source selecting mirror and motion imparting means, first slit providing means, first stage comprising a plurality of gratings and associated rotation imparting means, second slit providing means, second stage comprising a plurality of gratings and associated rotation imparting means, all have electrical plug-in/socket means;
and a mother printed circuit board which provides traces which in use carry electrical energy to said source selecting mirror motion imparting means, said first slit providing means, said first stage comprising a plurality of gratings and associated rotation imparting means, said second slit providing means, said second stage comprising a plurality of gratings and associated rotation imparting means; conductive traces on said mother printed circuit board providing access at a socket means which is extended outside said substantially enclosed space defining enclosing means.