US 6,982,006 B1 | ||
Method and apparatus for treating a substrate with an ozone-solvent solution | ||
David G. Boyers, 558 Fir La., Los Altos, Calif. 94024 (US); and Jay Theodore Cremer, Jr., 2181 Park Blvd., Palo Alto, Calif. 94306 (US) | ||
Filed on Oct. 19, 2000, as Appl. No. 9/693,012. | ||
Claims priority of provisional application 60/160435, filed on Oct. 19, 1999. | ||
Int. Cl. C23G 1/02 (2006.01) |
U.S. Cl. 134—3 | 39 Claims |
1. A method for treating a material, comprising:
forming an ozone-solvent solution at a first temperature;
passing said ozone-solvent solution through a heater to heat said ozone-solvent solution from said first temperature to form
a heated [−]ozone-solvent solution relative to said first temperature, such that said heated ozone-solvent solution is supersaturated
with ozone; and
reacting the supersaturated heated ozone-solvent solution with the material at a second temperature;
wherein the first temperature is less than the second temperature.
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