US 6,983,215 B2
RF metrology characterization for field installation and serviceability for the plasma processing industry
David J. Coumou, Webster, N.Y. (US); Clifford C. Weatherell, Rochester, N.Y. (US); Michael L. Kirk, Bloomfield, N.Y. (US); and Kevin Nasman, North Chili, N.Y. (US)
Assigned to MKS Instruments, Inc., Andover, Mass. (US)
Filed on Dec. 02, 2003, as Appl. No. 10/727,081.
Prior Publication US 2005/0119864 A1, Jun. 02, 2005
Int. Cl. G01R 35/00 (2006.01)
U.S. Cl. 702—106 20 Claims
OG exemplary drawing
 
1. A radio frequency (RF) metrology system for monitoring output of an RF generator to a load comprising:
a sensor, the sensor sensing at least one of a voltage or current applied to a load;
an analysis module, the analysis module receiving at least one of a voltage sensor signal or current sensor signal from the sensor;
wherein at least one of the sensor or the analysis module is replaceable while the other of the sensor or analysis module remains installed and wherein the RF metrology system is recalibrated following replacement of the other of the sensor or analysis module.