US 6,982,133 B2 | ||
Damage-resistant coatings for EUV lithography components | ||
Manish Chandhok, Beaverton, Oreg. (US); and Kramadhati V. Ravi, Atherton, Calif. (US) | ||
Assigned to Intel Corporation, Santa Clara, Calif. (US) | ||
Filed on Dec. 21, 2002, as Appl. No. 10/327,599. | ||
Prior Publication US 2004/0121243 A1, Jun. 24, 2004 | ||
Int. Cl. G01F 9/00 (2006.01) |
U.S. Cl. 430—5 | 21 Claims |
1. A method for protecting a lithographic component from damage, comprising:
depositing a diamond coating onto radiation-exposed surfaces of the component using a plasma-enhanced chemical vapor deposition
process; and
wherein said depositing is depositing a diamond coating onto the reflecting surfaces of a reflecting mask reticle.
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