US 6,982,232 B2
Photolithography methods and systems
Nicholas F. Borrelli, Elmira, N.Y. (US); Charlene M. Smith, Corning, N.Y. (US); and Johannes Moll, Painted Post, N.Y. (US)
Assigned to Corning Incorporated, Corning, N.Y. (US)
Filed on May 11, 2004, as Appl. No. 10/842,979.
Application 10/842979 is a division of application No. 09/967841, filed on Sep. 27, 2001, granted, now 6,754,002, filed on Jun. 22, 2004.
Claims priority of provisional application 60/237621, filed on Oct. 03, 2000.
Prior Publication US 2004/0235635 A1, Nov. 25, 2004
Int. Cl. C03C 3/06 (2006.01)
U.S. Cl. 501—54 6 Claims
 
1. A synthetic glass optical member for use with pulsed ultraviolet radiation having a wavelength shorter than about 200 nm and a fluence of less than about 8 mJ/cm2/pulse, said synthetic glass optical member comprising high purity fused silica glass having a concentration of molecular hydrogen of between about 0.05×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 and a predictably evolving wavefront distortion when exposed to pulsed ultraviolet lithography radiation produced by an ArF excimer laser at a fluence of less than about 1.5 mJ/cm2/pulse.