US 7,321,048 B2
Organometallic compound purification
Deodatta Vinayak Shenai-Khatkhate, Danvers, Mass. (US); and Ronald L. DiCarlo, Jr., Danville, N.H. (US)
Assigned to Rohm and Haas Electronic Materials LLC, Marlborough, Mass. (US)
Filed on Nov. 17, 2006, as Appl. No. 11/600,998.
Claims priority of provisional application 60/738117, filed on Nov. 18, 2005.
Prior Publication US 2007/0117994 A1, May 24, 2007
Int. Cl. C07F 5/06 (2006.01); C07C 395/00 (2006.01); C07C 5/02 (2006.01)
U.S. Cl. 556—27  [556/1; 556/70; 556/87; 556/121; 556/187; 568/1; 568/7; 562/899; 210/634; 210/639] 10 Claims
 
1. A method of purifying an organometallic compound comprising i) providing a mixture comprising a) an organometallic compound chosen from unsymmetrical dimethyl hydrazine and a compound of the formula R1R2n−1M1 wherein R1 is chosen from (C1-C20)alkyl, (C2-C12)dialkylamino, (C1-C12)alkylamino(C1-C12)alkyl, di(C1-C20)alkylamino(C1-C12)alkyl, (C2-C20)alkenyl, (C2-C20)alkynyl and aryl; each R2 is independently chosen from hydrogen, (C1-C20)alkyl, (C2-C12)dialkylamino, (C1-C12)alkylamino(C1-C12)alkyl, di(C1-C20)alkylamino(C1-C12)alkyl, (C2-C20)alkenyl, (C2-C20)alkynyl, aryl and halogen; M1 is a Group IIA to Group VIA metal; and n is the valence of M1; and b) a purifying composition comprising an alkyl-metal compound of the formula R3xR43-xM2 wherein R3 is a (C1-C20)alkyl; each R4 is independent chosen from hydrogen and halogen; M2 is a Group IIIA metal; and x is an integer from 1-3; and a catalyst compound; and ii) heating the mixture.