US 7,320,854 B2 | ||
Radiation sensitive refractive index changing composition, pattern forming method and optical material | ||
Masaaki Hanamura, Tokyo (Japan); Michinori Nishikawa, Tokyo (Japan); and Atsushi Kumano, Tokyo (Japan) | ||
Assigned to JSR Corporation, Tokyo (Japan) | ||
Filed on Jun. 24, 2004, as Appl. No. 10/874,391. | ||
Claims priority of application No. 2003-180855 (JP), filed on Jun. 25, 2003. | ||
Prior Publication US 2004/0265737 A1, Dec. 30, 2004 | ||
Int. Cl. G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/029 (2006.01) |
U.S. Cl. 430—270.1 [264/1.21; 264/1.36] | 20 Claims |
1. A radiation sensitive refractive index changing composition, comprising:
(A) an inorganic oxide particle,
(B) a polymerizable compound whose cross-linking density is increased by an acid, base or radical, each formed from a radiation
sensitive decomposer (C),
(C) said radiation sensitive decomposer, and
(D) 5 to 99 parts by weight of an escapable compound, based on 100 parts by weight of the total components (A) and (B);
wherein a film of said radiation sensitive refractive index changing composition exhibits a difference between a refractive
index of an unexposed portion and a refractive index of an exposed portion of said film of larger than 0.02.
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