US 7,321,416 B2
Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion
Martinus Cornelis Reijnen, Tilburg (Netherlands); Andrej Makarovic, Veldhoven (Netherlands); Lambertus Gerardus Maria Kessels, Aalst-Waalre (Netherlands); Stoyan Nihtianov, Eindhoven (Netherlands); Petrus Wilhelmus Josephus Maria Kemper, Waalre (Netherlands); and Kamen Hristov Chilov, Eindhoven (Netherlands)
Assigned to ASML Netherlands B.V., Veldhoven (Netherlands)
Filed on Jun. 15, 2005, as Appl. No. 11/152,849.
Prior Publication US 2006/0285094 A1, Dec. 21, 2006
Int. Cl. G03B 27/54 (2006.01); G03B 27/42 (2006.01)
U.S. Cl. 355—67  [355/53] 25 Claims
OG exemplary drawing
 
1. A lithographic apparatus, comprising:
an illumination system that supplies a beam of radiation;
a controllable patterning device comprising an array of individually controllable elements that pattern the beam;
a control system that outputs a voltage signal and controls the patterning device;
a projection system that projects the patterned beam onto a target portion of a substrate; and
a supply channel coupled between the control system and the patterning device,
wherein,
the patterning device comprises a plurality of cells, each cell comprising a respective one of the individually controllable elements and a respective local control circuit controllable to generate a respective control voltage that determines a configuration of the respective controllable element,
the supply channel provides the voltage signal to each cell,
the control system provides control signals to the plurality of local control circuits,
each local control circuit comprises a charge collector including a logic device, a switching system and an integration circuit, and
each local control circuit is responsive to the control signals to generate the respective control voltage from the voltage signal.