US 7,321,418 B2
Stage apparatus, exposure apparatus, and device manufacturing method
Yasuhito Sasaki, Utsunomiya (Japan); Yoshikazu Miyajima, Utsunomiya (Japan); Naosuke Nishimura, Utsunomiya (Japan); Hideo Tanaka, Utsunomiya (Japan); and Toshihiko Nishida, Utsunomiya (Japan)
Assigned to Canon Kabushiki Kaisha,
Filed on Oct. 13, 2005, as Appl. No. 11/249,700.
Claims priority of application No. 2004-299785 (JP), filed on Oct. 14, 2004.
Prior Publication US 2006/0082754 A1, Apr. 20, 2006
Int. Cl. G03B 27/58 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01); H02K 41/00 (2006.01)
U.S. Cl. 355—72  [355/53; 355/77; 310/12] 8 Claims
OG exemplary drawing
 
1. A stage apparatus, comprising:
a base;
a stage movable on the base in first and second directions;
a first mass body movable in the first direction so as to cancel a reaction force acting on the base according to a movement of the stage; and
a second mass body movable in the second direction so as to cancel a reaction force acting on the base according to a movement of the stage,
wherein the base has an inner space defined therein, and the first and second mass bodies are arranged in the inner space, and
wherein the first mass body is placed on the second mass body.