US 7,321,467 B2 | ||
Anti-reflection coating layer and design method thereof | ||
Chun-Chung Huang, Hsinchu (Taiwan) | ||
Assigned to MACRONIX International Co., Ltd., Hsinchu (Taiwan) | ||
Filed on May 26, 2005, as Appl. No. 10/908,783. | ||
Prior Publication US 2006/0268415 A1, Nov. 30, 2006 | ||
Int. Cl. G02B 1/10 (2006.01) |
U.S. Cl. 359—586 [359/589] | 17 Claims |
1. An anti-reflection coating layer suitable to be formed between an under layer and a photoresist layer, the anti-reflection
coating layer characterized in:
a refraction (n) of the anti-reflection coating layer, wherein n is a constant; and
an extinction coefficient (k) of the anti-reflection coating layer, wherein k is increased in gradient toward the under layer,
wherein the k of the anti-reflection coating layer is increased in gradient from a top set as 0 to the under layer.
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