US 7,320,946 B2
Method for generating dynamic mask pattern
Jeng-Ywan Jeng, Taipei (Taiwan); Jia-Chang Wang, Taipei (Taiwan); and Chang-Ho Shen, Hsinchu (Taiwan)
Assigned to National Taiwan University of Science and Technology, Taipei (Taiwan)
Filed on Jul. 15, 2005, as Appl. No. 11/160,921.
Application 11/160921 is a division of application No. 10/707628, filed on Dec. 25, 2003, abandoned.
Claims priority of application No. 92128666 A (TW), filed on Oct. 16, 2003.
Prior Publication US 2005/0244727 A1, Nov. 03, 2005
Int. Cl. H01L 21/30 (2006.01); G03F 9/00 (2006.01)
U.S. Cl. 438—800  [430/5; 716/21; 257/E21.38] 2 Claims
OG exemplary drawing
 
1. A method for generating a dynamic mask pattern, comprising:
providing a single-layer contour pattern having an outside contour and at least one inside contour;
identifying the outside contour and the inside contour;
establishing a figure window and filling color therein;
establishing the outside contour and the inside contour and filling color therein; and
sequentially attaching the outside contour and the inside contour filled with color to the figure window for forming a mask pattern.