US 7,321,417 B2 | ||
Spatial light modulator, lithographic apparatus and device manufacturing method | ||
Arno Jan Bleeker, Westerhoven (Netherlands) | ||
Assigned to ASML Netherlands B.V., Veldhoven (Netherlands) | ||
Filed on Dec. 21, 2006, as Appl. No. 11/642,604. | ||
Application 11/642604 is a continuation of application No. 10/875616, filed on Jun. 25, 2004, granted, now 7,154,587. | ||
Claims priority of application No. 03254140 (EP), filed on Jun. 30, 2003. | ||
Prior Publication US 2007/0097344 A1, May 03, 2007 | ||
This patent is subject to a terminal disclaimer. | ||
Int. Cl. G03B 27/54 (2006.01); G03B 27/42 (2006.01) |
U.S. Cl. 355—67 [355/53] | 11 Claims |
1. A patterning device, comprising:
an array of light modulating elements disposed on a support, the light modulating elements configured to modulate a radiation
beam; and
a control circuit configured to position respective ones of the light modulating elements according to a desired pattern,
the control circuit coupled to an opposite side of the support than the light modulating elements, and the control circuit
comprising a digital-to-analog converter, an analog-to-digital converter, an optical fiber input, and a processor.
|