US 7,320,167 B2 | ||
Longitudinal bias structure having stability with minimal effect on output | ||
Kenichi Takano, Cupertino, Calif. (US) | ||
Assigned to Headway Technologies, Inc., Milpitas, Calif. (US) | ||
Filed on Oct. 11, 2006, as Appl. No. 11/546,146. | ||
Application 11/546146 is a division of application No. 10/460087, filed on Jun. 12, 2003, granted, now 7,123,454. | ||
Prior Publication US 2007/0028442 A1, Feb. 08, 2007 | ||
Int. Cl. G11B 5/127 (2006.01) |
U.S. Cl. 29—603.07 | 8 Claims |
1. A process for manufacturing a CPP GMR read head, comprising:
providing a lower magnetic shield;
depositing a lower conductive lead layer on said lower magnetic shield;
depositing a compensatory bias layer on said lower conductive lead layer;
depositing, on said compensatory bias layer, a GMR stack whose top layer is a conductive non-magnetic layer;
depositing a free layer on said top layer;
depositing an upper conductive lead layer on said free layer;
coating said upper conductive lead layer with a layer of photoresist and then patterning said photoresist to form a mask that
defines said read head;
using said mask, etching unprotected parts of said upper conductive lead layer, said free layer, said GMR stack, said compensatory
bias layer, and said lower conductive lead layer, thereby forming a pedestal, that has vertical sidewalls as far down as said
lower conductive lead layer and sloping sidewalls formed from said lower conductive lead layer;
depositing a first dielectric layer that lies on said lower magnetic shield and sloping side walls and that abuts all of said
vertical sidewalls;
on said first dielectric layer, depositing a permanent magnet layer;
depositing a second dielectric layer on said permanent magnet layer;
then removing all photoresist; and
depositing an upper magnetic shield.
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