US 7,320,856 B2 | ||
Manufacturing method of pattern formed body | ||
Kaori Yamashita, Tokyo (Japan); Takashi Sawada, Tokyo (Japan); and Hironori Kobayashi, Tokyo (Japan) | ||
Assigned to Dai Nippon Printing Co., Ltd., Tokyo-to (Japan) | ||
Filed on Sep. 26, 2006, as Appl. No. 11/527,031. | ||
Claims priority of application No. 2005-285295 (JP), filed on Sep. 29, 2005. | ||
Prior Publication US 2007/0122754 A1, May 31, 2007 | ||
Int. Cl. G03F 7/00 (2006.01) |
U.S. Cl. 430—396 [134/1] | 1 Claim |
1. A manufacturing method of a plurality of pattern formed bodies, comprising a pattern forming step and a foreign matter
removing step,
wherein the pattern forming step is a step of radiating vacuum-ultraviolet light through a photomask to a pattern forming
substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property
varied on a surface of the pattern forming substrate to form a pattern formed body;
the pattern forming step is repeated plural times to manufacture a plurality of the pattern formed bodies;
the foreign matter removing step is a step performed between the repeated pattern forming steps and of radiating vacuum-ultraviolet
light from same light source as used in the pattern forming step to the photomask, in a state where the photomask and the
pattern forming substrate are not opposed to each other, to remove an foreign matter deposited onto the photomask;
wherein the foreign matter removing step is performed by radiating the vacuum-ultraviolet light in a state where the photomask
and a reflecting plate for reflecting the vacuum-ultraviolet light from the light source are opposed to each other.
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