US 7,321,232 B2 | ||
Charge amount measurement method, shift value measurement method of charged beam, charge amount measuring device and shift value measuring device of charged beam | ||
Masakazu Hayashi, Yokohama (Japan) | ||
Assigned to Kabushiki Kaisha Toshiba, Tokyo (Japan) | ||
Filed on Feb. 07, 2006, as Appl. No. 11/348,246. | ||
Application 11/348246 is a division of application No. 10/890241, filed on Jul. 14, 2004, granted, now 7,009,411. | ||
Application 10/890241 is a division of application No. 10/200503, filed on Jul. 23, 2002, abandoned. | ||
Claims priority of application No. 2001-222439 (JP), filed on Jul. 24, 2001. | ||
Prior Publication US 2006/0125495 A1, Jun. 15, 2006 | ||
Int. Cl. G01R 31/305 (2006.01); H01J 37/28 (2006.01) |
U.S. Cl. 324—751 [250/306; 250/310; 324/750] | 2 Claims |
1. A charge amount measurement method comprising:
interposing a measurement subject between a first substance and a second substance having a through hole;
measuring a first collision position where a charged beam passed through the through hole and vicinity of the measurement
subject collides against the first substance, in a state that there is no potential difference between the first substance
and the second substance;
measuring a second collision position where a charged beam passed through the through hole and vicinity of the measurement
subject collides against the first substance, in a state that there is a potential difference between the first substance
and the second substance; and
measuring a charge amount of the measurement subject based on a difference between the measured first collision position and
the measured second collision position.
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