US 7,321,415 B2 | ||
Environmental system including vacuum scavenge for an immersion lithography apparatus | ||
Andrew J. Hazelton, Tokyo (Japan); and Michael Sogard, Menlo Park, Calif. (US) | ||
Assigned to Nikon Corporation, Tokyo (Japan) | ||
Filed on Sep. 29, 2005, as Appl. No. 11/237,799. | ||
Application 11/237799 is a continuation of application No. PCT/IB04/02704, filed on Mar. 29, 2004. | ||
Claims priority of provisional application 60/484476, filed on Jul. 01, 2003. | ||
Claims priority of provisional application 60/462112, filed on Apr. 10, 2003. | ||
Prior Publication US 2006/0028632 A1, Feb. 09, 2006 | ||
Int. Cl. G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/58 (2006.01) |
U.S. Cl. 355—53 [355/72; 355/77] | 85 Claims |
1. An immersion exposure apparatus comprising:
an optical member for immersion exposure; and
a liquid containment member which is movable relative to the optical member, a space being formed between a surface and the
liquid containment member when the surface and the liquid containment member are disposed opposite to each other,
wherein the surface is movable relative to the optical member and the liquid containment member, and wherein the liquid containment
member contains a liquid with which a gap between the optical member and the surface is filled when the optical member and
the surface are disposed opposite to each other.
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