US 7,320,331 B1
In-situ plasma cleaning device for cylindrical surfaces
Michael J. Audino, Albany, N.Y. (US); Michael Cipollo, East Greenbush, N.Y. (US); David Glocker, West Henrietta, N.Y. (US); Kevin Miner, Castleton, N.Y. (US); and Patrick Vottis, Schnectady, N.Y. (US)
Assigned to United States of America as represented by the Secrertary of the Army, Washington, D.C. (US)
Filed on Sep. 30, 2003, as Appl. No. 10/605,432.
Int. Cl. C23C 14/34 (2006.01); B08B 3/00 (2006.01)
U.S. Cl. 134—166R  [134/1; 134/1.1; 134/104.2; 134/122 R; 156/345.42; 156/345.46; 156/345.49; 204/298.21; 204/298.22; 204/298.31; 204/298.37] 1 Claim
OG exemplary drawing
 
1. An in-situ plasma cleaning device for performing an atomic surface cleaning process to remove contaminants, comprising:
a cleaning assembly;
a magnetic field generator, located within the cleaning assembly, that generates a generally axially directed magnetic field to provide a plasma for cleaning a surface within the cleaning assembly;
wherein the cleaning assembly comprises a collector shield disposed opposite to the surface to be cleaned for collecting the contaminants and by-product material, wherein the cleaning assembly traverses the length of a target cylindrical surface and a substrate cylindrical surface during a cleaning process.