US 7,322,014 B2
Method of implementing polishing uniformity and modifying layout data
Edward O. Travis, Austin, Tex. (US); Nathan A. Aldrich, Pflugerville, Tex. (US); and Ruiqi Tian, Pflugerville, Tex. (US)
Assigned to Freescale Semiconductor, Inc., Austin, Tex. (US)
Filed on Nov. 01, 2006, as Appl. No. 11/555,314.
Application 11/555314 is a division of application No. 10/700883, filed on Nov. 04, 2003, granted, now 7,146,593.
Prior Publication US 2007/0061768 A1, Mar. 15, 2007
Int. Cl. G06F 17/50 (2006.01); H01L 21/302 (2006.01)
U.S. Cl. 716—2  [438/692] 12 Claims
OG exemplary drawing
 
1. A method of modifying a layout design of a material on a substrate for improving a polishing uniformity of the same, said method comprising:
performing one of blurring and defocusing of an overburden distribution of the layout data to provide a modified overburden distribution of a layout data;
determining from the modified overburden distribution of the layout data whether the modified overburden distribution of the layout data contains at least one area having an overburden density transition greater than a threshold amount; and
responsive to a determination that the modified overburden distribution of the layout data contains at least one area having a transition greater than the threshold amount, modifying the layout data to reduce the transition within the at least one area having the transition greater than the threshold amount.