US 7,320,946 B2 | ||
Method for generating dynamic mask pattern | ||
Jeng-Ywan Jeng, Taipei (Taiwan); Jia-Chang Wang, Taipei (Taiwan); and Chang-Ho Shen, Hsinchu (Taiwan) | ||
Assigned to National Taiwan University of Science and Technology, Taipei (Taiwan) | ||
Filed on Jul. 15, 2005, as Appl. No. 11/160,921. | ||
Application 11/160921 is a division of application No. 10/707628, filed on Dec. 25, 2003, abandoned. | ||
Claims priority of application No. 92128666 A (TW), filed on Oct. 16, 2003. | ||
Prior Publication US 2005/0244727 A1, Nov. 03, 2005 | ||
Int. Cl. H01L 21/30 (2006.01); G03F 9/00 (2006.01) |
U.S. Cl. 438—800 [430/5; 716/21; 257/E21.38] | 2 Claims |
1. A method for generating a dynamic mask pattern, comprising:
providing a single-layer contour pattern having an outside contour and at least one inside contour;
identifying the outside contour and the inside contour;
establishing a figure window and filling color therein;
establishing the outside contour and the inside contour and filling color therein; and
sequentially attaching the outside contour and the inside contour filled with color to the figure window for forming a mask
pattern.
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