US 7,321,417 B2
Spatial light modulator, lithographic apparatus and device manufacturing method
Arno Jan Bleeker, Westerhoven (Netherlands)
Assigned to ASML Netherlands B.V., Veldhoven (Netherlands)
Filed on Dec. 21, 2006, as Appl. No. 11/642,604.
Application 11/642604 is a continuation of application No. 10/875616, filed on Jun. 25, 2004, granted, now 7,154,587.
Claims priority of application No. 03254140 (EP), filed on Jun. 30, 2003.
Prior Publication US 2007/0097344 A1, May 03, 2007
This patent is subject to a terminal disclaimer.
Int. Cl. G03B 27/54 (2006.01); G03B 27/42 (2006.01)
U.S. Cl. 355—67  [355/53] 11 Claims
OG exemplary drawing
 
1. A patterning device, comprising:
an array of light modulating elements disposed on a support, the light modulating elements configured to modulate a radiation beam; and
a control circuit configured to position respective ones of the light modulating elements according to a desired pattern, the control circuit coupled to an opposite side of the support than the light modulating elements, and the control circuit comprising a digital-to-analog converter, an analog-to-digital converter, an optical fiber input, and a processor.