US 7,321,419 B2 | ||
Exposure apparatus, and device manufacturing method | ||
Akimitsu Ebihara, Fukaya (Japan) | ||
Assigned to Nikon Corporation, Tokyo (Japan) | ||
Filed on Oct. 27, 2005, as Appl. No. 11/258,846. | ||
Application 11/258846 is a continuation of application No. PCT/JP2004/008595, filed on Jun. 18, 2004. | ||
Claims priority of application No. 2003-174259 (JP), filed on Jun. 19, 2003. | ||
Prior Publication US 2006/0114445 A1, Jun. 01, 2006 | ||
Int. Cl. G03B 27/58 (2006.01); G03B 27/42 (2006.01); G03B 27/52 (2006.01) |
U.S. Cl. 355—72 [355/30; 355/53] | 7 Claims |
1. An exposure apparatus that supplies liquid in a space between a projection optical system and a substrate, illuminates
a pattern with an energy beam, and projects an image of the pattern onto the substrate via the projection optical system and
the liquid, the exposure apparatus comprising:
a first table where a mount area is formed and the surface of an area around the mount area is set substantially flush to
the surface of a substrate mounted on the mount area, the first table being movable within an area that includes a first area
containing a position below the projection optical system;
a second table where a mount area is formed and the surface of an area around the mount area is set substantially flush to
the surface of a substrate mounted on the mount area, the second table being movable independently from the first table within
an area including the first area; and
a stage drive system by which the first table and the second table are moved simultaneously from a first state in which one
of the tables is positioned at the first area to a second state in which the other table is positioned at the first area while
maintaining a state in which both tables are in contact with each other or close together to prevent liquid from flowing between
the tables.
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