US 12,168,851 B2
Woven papermaking fabric having machine and cross-machine oriented topography
Lynda Ellen Collins, Neenah, WI (US); and Mark Alan Burazin, Oshkosh, WI (US)
Filed by Kimberly-Clark Worldwide, Inc., Neenah, WI (US)
Filed on Jun. 2, 2022, as Appl. No. 17/830,754.
Application 17/830,754 is a continuation of application No. 16/650,068, granted, now 11,377,797, previously published as PCT/US2018/053077, filed on Sep. 27, 2018.
Claims priority of provisional application 62/565,625, filed on Sep. 29, 2017.
Prior Publication US 2022/0290372 A1, Sep. 15, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. D21F 7/08 (2006.01); D21F 11/00 (2006.01); D21H 27/00 (2006.01); D21H 27/02 (2006.01)
CPC D21F 7/08 (2013.01) [D21F 11/006 (2013.01); D21H 27/002 (2013.01); D21H 27/02 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A woven papermaking fabric comprising a plurality of substantially machine direction (MD) oriented warp filaments interwoven with a plurality of substantially cross-machine direction (CD) oriented shute filaments to form an underlying woven fabric layer and a first pocket disposed thereon, the first pocket having a first side wall formed by a first warp filament and a second warp filament, a second side wall formed by a third warp filament and a fourth warp filament, a first end wall formed by a first shute filament and a second end wall formed by a second shute filament, wherein the first and second shute filaments are woven above and supported by the first and third warp filaments and the second and the fourth warp filaments are woven above and supported by the first and second shute filaments.