CPC H01L 22/26 (2013.01) [G01N 21/255 (2013.01); G01N 21/27 (2013.01); G01N 21/3504 (2013.01); G01N 21/3586 (2013.01); H01J 1/00 (2013.01); H01J 37/3211 (2013.01); H01J 37/32119 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01J 37/32917 (2013.01); H01L 21/6831 (2013.01); G01N 2201/0636 (2013.01); H01J 2237/2007 (2013.01)] | 13 Claims |
1. A plasma treatment apparatus comprising:
a light generator configured to generate light;
a chamber configured to receive the light generated by the light generator;
an optical element disposed between the light generator and the chamber;
a light detector configured to detect reflected light reflected from inside the chamber; and
a controller connected to the light generator and the light detector,
wherein the chamber comprises an electrostatic chuck in a lower portion of the chamber, an edge ring around the electrostatic chuck, an outer wall that seals an inner space of the chamber, and a gas supply configured to inject a process gas into the chamber, and
wherein the optical element is configured to branch the light generated by the light generator into branched light, and irradiate the branched light to different regions of the chamber.
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