US 12,169,360 B2
Resist composition and patterning process
Jun Hatakeyama, Joetsu (JP)
Assigned to Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Jul. 7, 2021, as Appl. No. 17/368,970.
Claims priority of application No. 2020-123097 (JP), filed on Jul. 17, 2020.
Prior Publication US 2022/0026803 A1, Jan. 27, 2022
Int. Cl. G03F 7/004 (2006.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01); C08F 220/34 (2006.01); C08F 220/38 (2006.01); C09D 125/18 (2006.01); C09D 133/16 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01)
CPC G03F 7/0046 (2013.01) [C08F 212/22 (2020.02); C08F 220/281 (2020.02); C08F 220/282 (2020.02); C08F 220/301 (2020.02); C08F 220/387 (2020.02); C09D 125/18 (2013.01); C09D 133/16 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01)] 14 Claims
 
1. A resist composition comprising
an ammonium salt and fluorine-containing polymer comprising repeat units AU having an ammonium salt structure of a carboxylic acid having an iodine or bromine-substituted aromatic ring and repeat units of at least one type selected from repeat units FU-1 having a trifluoromethylalcohol group which may be substituted with an acid labile group and repeat units FU-2 having a fluorinated hydrocarbyl group, and
a base polymer.