CPC H01L 21/68764 (2013.01) [H01L 21/67051 (2013.01); H01L 21/68792 (2013.01)] | 14 Claims |
1. A substrate support assembly for a substrate treatment apparatus, comprising:
a chuck base supporting a substrate to be treated, disposed rotatable around a rotation axis perpendicular to the supported substrate, and having an installation accommodation portion of ring shape extending along a circumferential direction with respect to the rotation axis and a receiving recess bottom disposed at an inner lower part surrounded by the installation accommodation portion and connected to the installation accommodation portion, wherein a receiving recess is formed by the receiving recess bottom and an inside surface of the installation accommodation portion, and formed open on the top thereof;
chuck pins disposed on the top of the installation accommodation portion of the chuck base and movable along directions away from and approaching the substrate;
a mechanism unit disposed in the installation accommodation portion and connected to the chuck pins to move the chuck pins;
a driving unit for transmitting power to the mechanism unit; and
an ultrasonic cleaning unit disposed in the receiving recess,
wherein, in a plan view, the ultrasonic cleaning unit is extended radially about the rotation axis.
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