CPC C25D 5/611 (2020.08) [C25D 5/617 (2020.08); C25D 7/0614 (2013.01)] | 5 Claims |
1. An electrodeposited copper foil having a ten-point average roughness Rz of 0.1 μm or larger and 2.0 μm or smaller on at least one surface,
wherein in cross-sectional analysis by electron backscatter diffraction (EBSD), a proportion of an area occupied by copper crystal grains satisfying all of the following conditions:
i) (101) orientation;
ii) an aspect ratio of 0.500 or less;
iii) |sin θ| of 0.001 or more and 0.707 or less, where θ (°) is an angle between a normal line of an electrode surface of the electrodeposited copper foil and a major axis of the copper crystal grain; and
iv) when the crystal is elliptically approximated, a length of a minor axis of 0.38 μm or smaller,
relative to an area of an observation field occupied by copper crystal grains is 63% or more.
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