CPC H01J 37/32477 (2013.01) [H01J 37/32 (2013.01); H01J 37/32174 (2013.01); H01J 37/32522 (2013.01); H01J 37/32568 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/24585 (2013.01)] | 7 Claims |
1. A substrate processing apparatus comprising:
a process chamber configured to provide a reaction space for processing a substrate;
a first electrode installed in the process chamber to face the substrate;
a second electrode positioned beneath the first electrode;
a substrate support installed opposite to the first or second electrode and configured to support the substrate; and
an RF power supply configured to supply at least one RF power to at least one of the first and second electrodes,
wherein when a temperature of the first or second electrode is out of each set range or a temperature of the first electrode or the substrate support is out of each set range, the supply of the at least one RF power is stopped,
wherein the substrate processing apparatus further comprises:
a measurement unit configured to measure the temperature of the first electrode and the temperature of at least one of the second electrode and the substrate support;
a comparison unit configured to generate an interlock signal when it is determined that the temperature of the first or second electrode is out of the each set range by comparing them or that the temperature of the first electrode or the substrate support is out of the each set range by comparing them; and
a control unit configured to stop the supply of the at least one RF power when the interlock signal is input to the control unit,
wherein the comparison unit determines whether to generate the interlock signal, based on:
a first criterion for determining whether the temperature of the first electrode and the temperature of at least one of the second electrode and the substrate support are a room temperature of 50° C. or less;
a second criterion for determining whether the temperature of the first or second electrode is within the each set range; and
a third criterion for determining whether the temperature of the first electrode or the substrate support is within the each set range.
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