CPC H01L 27/1288 (2013.01) [G03F 1/42 (2013.01); G03F 1/70 (2013.01); G03F 7/0007 (2013.01); G03F 7/2022 (2013.01); H01L 23/544 (2013.01); H01L 2223/54493 (2013.01)] | 15 Claims |
1. A manufacturing method of a display device comprising:
forming a metal layer and a photoresist on a substrate;
aligning a photomask on the substrate and irradiating light onto the photomask;
repeating a process of shifting the photomask and irradiating the light onto the photomask;
forming a test resist pattern on the display device by developing the photoresist;
determining an alignment error of the photomask based on a shape of the test resist pattern, and repeating processes of forming, aligning, irradiating, shifting, and developing based on determination of the alignment error; and
etching the metal layer by using the photoresist as a mask,
wherein the test resist pattern includes:
a first test resist pattern, a second test resist pattern, and a third test resist pattern disposed along a first edge of the substrate,
the third test resist pattern is disposed between the first test resist pattern and the second test resist pattern,
the first test resist pattern has a first outer shape and a first inner shape,
the third test resist pattern has a third outer shape and a third inner shape, and
the second test resist pattern has a second outer shape.
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