CPC G03F 9/7088 (2013.01) [G03F 7/70383 (2013.01); G03F 9/7026 (2013.01)] | 20 Claims |
1. A device for exposure control in photolithographic direct exposure of two-dimensional structures in photosensitive coatings on a substrate, comprising:
a registration unit for the registration of target marks located on a substrate surface,
a movable table system for the support of and defined one-dimensional movement of the substrate under the registration unit,
a processing unit with a controllable linear processing path for the photolithographic processing of the substrate by means of a processing beam for introducing the two-dimensional structures and a computer unit for controlling the alignment between the processing path and the substrate by means of local adjustment of the photolithographic processing depending on the position of the substrate determined by registered target marks, characterized in that a plurality of entocentric cameras are arranged in the registration unit in linear alignment transverse to the one-dimensional movement of the substrate to form a gapless linear scanning area over a predetermined width of the substrate and have angles of view extending in a direction of the linear scanning area, wherein the angles of view of adjacent of the entocentric cameras have an overlapping region along the linear scanning area in order to detect redundant image captures of the substrate of the adjacent entocentric cameras in the overlapping region, and in that the computer unit has means for calculating the position of the target marks from the redundant image captures in the overlapping region of the adjacent entocentric cameras additionally using a height position of the target marks which is determined by triangulation of a distance of the substrate surface.
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