CPC H01J 37/32394 (2013.01) [C23C 14/35 (2013.01); C23C 16/50 (2013.01); H01J 37/32339 (2013.01); H01J 37/32541 (2013.01); H01J 37/32697 (2013.01); H01J 2237/332 (2013.01)] | 18 Claims |
1. A plasma deposition apparatus, comprising:
a first plasma source configured to produce a first plasma confined in a magnetic field, comprising:
a gas distribution device configured to supply a gas;
a closed-loop electrode defining a center region therein and a central axis through the central region; and
one or more magnets that are outside an inner surface of the closed-loop electrode, wherein the one or more magnets are configured to produce the magnetic field in the center region,
wherein the closed-loop electrode and the one or more magnets are configured to produce the first plasma of activated atoms, molecules, electrons, and ions from the gas; and
a collimator configured to collimate the activated atoms, molecules, electrons, and ions produced by the first plasma source and to direct the ions to a substrate, wherein the collimator comprises:
parallel ribbons; and
a transport mechanism configured to move the parallel ribbons to expose clean portions of the parallel ribbons to deposition.
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