US 12,171,053 B2
System for monitoring a plasma
Michael Anthony Purvis, San Diego, CA (US); Klaus Martin Hummler, San Diego, CA (US); Chengyuan Ding, San Diego, CA (US); Robert Jay Rafac, Encinitas, CA (US); and Igor Vladimirovich Fomenkov, San Diego, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Jan. 25, 2022, as Appl. No. 17/583,799.
Application 17/583,799 is a continuation of application No. 16/756,185, granted, now 11,266,002, previously published as PCT/EP2018/078689, filed on Oct. 19, 2018.
Claims priority of provisional application 62/577,208, filed on Oct. 19, 2018.
Prior Publication US 2022/0151052 A1, May 12, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. H05G 2/00 (2006.01); G03F 7/00 (2006.01)
CPC H05G 2/008 (2013.01) [G03F 7/70033 (2013.01); G03F 7/7085 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of mitigating debris in a plasma-generating process, the method comprising:
accessing first information relating to a temporal property of an amplified optical beam pulse that interacts with a target comprising target material at a plasma formation location;
accessing second information relating to a temporal property of a light-emitting plasma produced when some of the target material of the target is converted into the light-emitting plasma during the plasma-generating process; and
determining an amount of target material converted to the light-emitting plasma by comparing the first information and the second information.