CPC H01L 21/6833 (2013.01) [B08B 3/04 (2013.01); B08B 7/00 (2013.01); C23C 14/505 (2013.01); H01L 21/67011 (2013.01)] | 20 Claims |
1. A method comprising:
detecting a location of a particle on a bottom surface of an electrostatic chuck, comprising:
attaching a dummy photomask on the bottom surface of the electrostatic chuck;
transmitting radiation toward the dummy photomask;
receiving a reflection of the radiation from the dummy photomask; and
analyzing the radiation transmitted toward the dummy photomask with the reflection of the radiation from the dummy photomask to obtain the location of the particle;
moving a platform to a position under the bottom surface of the electrostatic chuck and right under the particle; and
rotating the platform about a center of the platform to remove the particle from the bottom surface of the electrostatic chuck.
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