US 12,171,054 B2
EUV light source with a beam positioning device
Martin Lambert, Korb (DE); Boris Regaard, Stuttgart (DE); Tolga Ergin, Bietigheim-Bissingen (DE); and Oliver Schlosser, Filderstadt (DE)
Assigned to TRUMPF Lasersystems for Semiconductor Manufacturing SE, Ditzingen (DE)
Filed by TRUMPF Lasersystems for Semiconductor Manufacturing GmbH, Ditzingen (DE)
Filed on Apr. 24, 2024, as Appl. No. 18/644,458.
Application 18/644,458 is a continuation of application No. PCT/EP2021/079514, filed on Oct. 25, 2021.
Prior Publication US 2024/0357726 A1, Oct. 24, 2024
Int. Cl. H05G 2/00 (2006.01); G03F 7/00 (2006.01)
CPC H05G 2/008 (2013.01) [G03F 7/70033 (2013.01)] 15 Claims
OG exemplary drawing
 
1. An extreme ultraviolet (EUV) light source comprising:
a providing device for providing a target material,
at least one pulsed laser source for emitting at least one pulsed laser beam,
a beam guidance device for supplying the at least one pulsed laser beam from the at least one pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the at least one pulsed laser beam within the radiation generation chamber,
the target material being configured to emit EUV radiation on account of the irradiation,
wherein
the beam guidance device comprises at least one beam positioning device comprising four mirrors as two mirror pairs for positioning the at least one pulsed laser beam, wherein each of the four mirrors is rotatable about exactly one axis of rotation, the axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction, and the axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.